Transmission Electron Microscopy of Semiconductor Nanostructures

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Focusing on advanced techniques in semiconductor electron microscopy, this book equips readers with tools for precise composition analysis of ternary nanostructures at near-atomic resolution. It introduces innovative methods like strain state analysis and the CELFA technique for lattice fringe analysis. The text covers the fundamentals of transmission electron microscopy, followed by digital image analysis methods, and explores applications such as determining composition in InGaAs quantum dots. Additionally, it highlights the enhanced precision achieved by integrating CELFA with electron holography.